Accurate wavelength spacing from absorption-coupled DFB laser arrays

Author

Talneau, A. ; Bouadma, N. ; Slempkes, S. ; Ougazzaden, A. ; Hansmann, S.

Author_Institution

CNET, Bagneux, France

Volume

9

Issue

10

fYear

1997

Firstpage

1316

Lastpage

1318

Abstract

Six-element absorption-coupled distributed-feedback (DFB) arrays have been fabricated by means of holographic lithography. Using a simple current injection scheme in two-section devices, a standard deviation of 0.11 nm from a uniform wavelength channel spacing of 2 nm has been achieved. This value is easily obtained using standard lithography technologies for fabrication, and coarse current control for operation. It allows the use of complex-coupled DPB lasers as sources in photonic integrated circuits.

Keywords

distributed feedback lasers; electron beam lithography; holographic gratings; integrated optics; light absorption; optical fabrication; quantum well lasers; semiconductor laser arrays; GaInAsP; absorption-coupled DFB laser arrays; accurate wavelength spacing; coarse current control; complex-coupled DPB lasers; electron beam lithography; fabrication; holographic grating technology; holographic lithography; operation; photonic integrated circuits; simple current injection; six-element absorption-coupled distributed-feedback arrays; sources; two-section devices; uniform wavelength channel spacing; Distributed feedback devices; Etching; Gratings; Holography; Indium phosphide; Lithography; Optical arrays; Resists; Semiconductor laser arrays; Surface emitting lasers;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/68.623248

Filename

623248