DocumentCode :
1557758
Title :
MOSFET subthreshold compact modeling with effective gate overdrive
Author :
Lim, Khee Yong ; Zhou, Xing
Author_Institution :
Chartered Semicond. Manuf. Ltd, Singapore, Singapore
Volume :
49
Issue :
1
fYear :
2002
fDate :
1/1/2002 12:00:00 AM
Firstpage :
196
Lastpage :
199
Abstract :
In this work, a previously-proposed one-region MOSFET drain current (Id.) model is improved in the subthreshold modeling. The compact model is derived based on a first-principle drift-diffusion formulation with the correct drift and diffusion currents in strong inversion and subthreshold, respectively. The new model has only one fitting parameter for subthreshold slope and can ensure excellent continuity with smooth transition from subthreshold to strong-inversion regimes, including the moderate-inversion region of growing importance for low-voltage and low-power circuits
Keywords :
MOSFET; diffusion; semiconductor device models; MOSFET drain current model; MOSFET subthreshold compact modeling; deep-submicron MOSFETs; drift-diffusion formulation; effective gate overdrive; fitting parameter; moderate-inversion region; strong inversion; subthreshold slope; unified one-region drain current model; Circuit simulation; FETs; Fitting; MOSFET circuits; Manufacturing industries; Physics; Semiconductor device manufacture; Smoothing methods; Threshold voltage; Ultra large scale integration;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.974771
Filename :
974771
Link To Document :
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