DocumentCode :
1558379
Title :
Effect of the Surface Bond States in as-Deposited DLC Films on the Incorporation of Nitrogen and Oxygen Atoms
Author :
Nitta, Yuki ; Okamoto, Keishi ; Nakatani, Tatsuyuki ; Shinohara, Masanori
Author_Institution :
TOYO Adv. Technol. Co., Ltd., Hiroshima, Japan
Volume :
40
Issue :
8
fYear :
2012
Firstpage :
2073
Lastpage :
2078
Abstract :
We have investigated the relation of bonding states in as-deposited diamond-like carbon (DLC) films and the incorporation of N and O atoms into DLC films, following plasma treatment of the surface. After deposition with various coating methods and under different conditions, the DLC films were treated with NH3 or O2 plasma. We investigated the changes in bonding states of the films using X-ray photoelectron spectroscopy (XPS). The results suggested that the incorporation due to plasma treatment was affected by the bonding states in the as-deposited DLC films. The C-H/C-C and the sp2 C-C/sp3 C-C ratios in the as-deposited DLC films play an important role in controlling N and O incorporation into the DLC films.
Keywords :
X-ray photoelectron spectra; diamond-like carbon; nitrogen; oxygen; plasma deposited coatings; plasma materials processing; C-H-C-C ratios; NH3 plasma treatment; O2 plasma treatment; X-ray photoelectron spectroscopy; as-deposited DLC films; as-deposited diamond-like carbon films; bonding states; coating methods; nitrogen atom incorporation; oxygen atom incorporation; sp2 C-C-sp3 C-C ratios; surface bond state effect; surface plasma treatment; Atomic layer deposition; Bonding; Films; Hydrogen; Plasmas; Radio frequency; Surface treatment; Diamond-like carbon (DLC); plasma surface treatment; surface structure;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2012.2203613
Filename :
6243216
Link To Document :
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