Title :
Control of RF Match Presets: Common Source of Variation
Author_Institution :
Nat. Semicond., South Portland, ME
Abstract :
While reviewing several scenarios of high reflected power, this paper discusses the importance of maintaining dry etch RF match tune and load recipe presets to minimize variation in critical process outputs and presents a systematic method to efficiently maintain presets using factory automation.
Keywords :
factory automation; sputter etching; statistical process control; RF match presets; dry etch RF match tune; factory automation; load recipe presets; Etching; Hardware; Manufacturing automation; Plasma applications; Power engineering and energy; Process control; Production; RF signals; Radio frequency; Semiconductor device manufacture; RF; automation; efficiency; presets; process control; yield;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2008. ASMC 2008. IEEE/SEMI
Conference_Location :
Cambridge, MA
Print_ISBN :
978-1-4244-1964-7
Electronic_ISBN :
1078-8743
DOI :
10.1109/ASMC.2008.4529034
