Title :
Direct magnetic patterning of non-magnetic Co/C thin films by electron-beam radiation
Author :
Zhou, T.J. ; Zhao, Y. ; Wang, J.P. ; Chong, T.C. ; Thong, J.T.L.
Author_Institution :
Data Storage Inst., Singapore, Singapore
Abstract :
Summary form only given. Conventional electron beam lithography (EBL) has been used for fabricating patterned nanostructure, however, it involves the cumbersome process of resist coating, etching, lift-off, etc., which greatly complicates the production of patterned nanostructures. Mask-assistant ion beam mixing of multilayer films has been proposed but demonstrated low-resolution. A novel method involving direct magnetic patterning of a non-magnetic film by e-beam radiation induced nano-scale phase change is proposed in this paper, and preliminary results are presented. Metastable amorphous Co-C thin films were selected for this study.
Keywords :
amorphous magnetic materials; carbon; cobalt; electron beam lithography; ferromagnetic materials; magnetic thin films; nanostructured materials; pattern formation; 30 to 60 nm; Co-C; direct magnetic patterning; electron-beam radiation; nonmagnetic Co/C thin films; patterned nanostructure; Amorphous magnetic materials; Coatings; Electron beams; Etching; Ion beams; Lithography; Magnetic films; Magnetic multilayers; Production; Resists;
Conference_Titel :
Magnetics Conference, 2002. INTERMAG Europe 2002. Digest of Technical Papers. 2002 IEEE International
Conference_Location :
Amsterdam, The Netherlands
Print_ISBN :
0-7803-7365-0
DOI :
10.1109/INTMAG.2002.1001308
