• DocumentCode
    1587587
  • Title

    Insulator secondary electron emission and surface charge measurements by electron energy spectrometry

  • Author

    Elizondo, J.M. ; Dragt, A. ; Krogh, M. ; Meredith, K. ; Lapetina, N.

  • Author_Institution
    Honeywell FM&T/NM, Albuquerque, NM, USA
  • Volume
    2
  • fYear
    2001
  • Firstpage
    1806
  • Abstract
    The secondary electron emission (SEE) coefficient is strongly dependent on material type due to the fact that secondary electrons come primarily from inelastic electron collisions and intrinsic lattice losses (e.g., plasmon losses). Other macroscopic factors affecting the emission process are related to surface finish, surface coatings, ion implantation, and surface preparation and cleaning procedures. SEE plays a key role in most proposed models for insulator surface flash-over development. We have measured total surface electron yield from a number of materials as well as from similar materials with different surface treatments. The experiments were performed using both a continuous wave and a pulsed electron gun with a hemispherical electron energy spectrometer at vacuum levels in the range of 10/sup -8/ Torr. Electron spectroscopy reveals a substantial difference in total electron yield due to minor changes in surface finish. The results of SEE measurements and the secondary electron energy distribution, using both continuous wave and pulsed electron beams, are presented. Quasi-metalized surfaces show a distinct improvement over non-treated samples. Data obtained under high voltage conditions correlates to the improvement. Another measurement characterized insulator surface charge as a function of pulse length, number of pulses, and total electron beam current. Material surface charge characteristics using electron pulses from 100 /spl mu/sec and up to 1 msec are presented. Results indicate radically different surface charge behavior between single pulse, repetitive pulse, and continuous wave experiments.
  • Keywords
    flashover; insulators; ion implantation; plasmons; secondary electron emission; 10/sup -8/ torr; cleaning procedures; electron energy spectrometry; electron pulses; electron spectroscopy; electron yield; hemispherical electron energy spectrometer; high voltage conditions; inelastic electron collisions; insulator secondary electron emission; insulator surface charge; insulator surface flash-over development; intrinsic lattice losses; ion implantation; macroscopic factors; material surface charge characteristics; nontreated samples; plasmon losses; pulsed electron gun; quasimetallized surfaces; repetitive pulse; secondary electron energy distribution; surface charge behavior; surface charge measurements; surface coatings; surface finish; surface preparation; surface treatments; total electron beam current; vacuum levels; Charge measurement; Electron beams; Electron emission; Insulation; Lattices; Plasmons; Pulse measurements; Spectroscopy; Surface finishing; Surface treatment;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Pulsed Power Plasma Science, 2001. PPPS-2001. Digest of Technical Papers
  • Conference_Location
    Las Vegas, NV, USA
  • Print_ISBN
    0-7803-7120-8
  • Type

    conf

  • DOI
    10.1109/PPPS.2001.1001924
  • Filename
    1001924