DocumentCode
1587587
Title
Insulator secondary electron emission and surface charge measurements by electron energy spectrometry
Author
Elizondo, J.M. ; Dragt, A. ; Krogh, M. ; Meredith, K. ; Lapetina, N.
Author_Institution
Honeywell FM&T/NM, Albuquerque, NM, USA
Volume
2
fYear
2001
Firstpage
1806
Abstract
The secondary electron emission (SEE) coefficient is strongly dependent on material type due to the fact that secondary electrons come primarily from inelastic electron collisions and intrinsic lattice losses (e.g., plasmon losses). Other macroscopic factors affecting the emission process are related to surface finish, surface coatings, ion implantation, and surface preparation and cleaning procedures. SEE plays a key role in most proposed models for insulator surface flash-over development. We have measured total surface electron yield from a number of materials as well as from similar materials with different surface treatments. The experiments were performed using both a continuous wave and a pulsed electron gun with a hemispherical electron energy spectrometer at vacuum levels in the range of 10/sup -8/ Torr. Electron spectroscopy reveals a substantial difference in total electron yield due to minor changes in surface finish. The results of SEE measurements and the secondary electron energy distribution, using both continuous wave and pulsed electron beams, are presented. Quasi-metalized surfaces show a distinct improvement over non-treated samples. Data obtained under high voltage conditions correlates to the improvement. Another measurement characterized insulator surface charge as a function of pulse length, number of pulses, and total electron beam current. Material surface charge characteristics using electron pulses from 100 /spl mu/sec and up to 1 msec are presented. Results indicate radically different surface charge behavior between single pulse, repetitive pulse, and continuous wave experiments.
Keywords
flashover; insulators; ion implantation; plasmons; secondary electron emission; 10/sup -8/ torr; cleaning procedures; electron energy spectrometry; electron pulses; electron spectroscopy; electron yield; hemispherical electron energy spectrometer; high voltage conditions; inelastic electron collisions; insulator secondary electron emission; insulator surface charge; insulator surface flash-over development; intrinsic lattice losses; ion implantation; macroscopic factors; material surface charge characteristics; nontreated samples; plasmon losses; pulsed electron gun; quasimetallized surfaces; repetitive pulse; secondary electron energy distribution; surface charge behavior; surface charge measurements; surface coatings; surface finish; surface preparation; surface treatments; total electron beam current; vacuum levels; Charge measurement; Electron beams; Electron emission; Insulation; Lattices; Plasmons; Pulse measurements; Spectroscopy; Surface finishing; Surface treatment;
fLanguage
English
Publisher
ieee
Conference_Titel
Pulsed Power Plasma Science, 2001. PPPS-2001. Digest of Technical Papers
Conference_Location
Las Vegas, NV, USA
Print_ISBN
0-7803-7120-8
Type
conf
DOI
10.1109/PPPS.2001.1001924
Filename
1001924
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