• DocumentCode
    1589697
  • Title

    A silicon wafer dissolved vibrating gyroscope

  • Author

    Yahong, Yao ; Zhongyu, GAO ; Rong, Zhang ; Yuqian, Dong ; Zhiyong, Chen

  • Author_Institution
    Dept. of Precision Instrum., Tsinghua Univ., Beijing, China
  • Volume
    2
  • fYear
    1998
  • Firstpage
    1133
  • Abstract
    Since micromachining technology has raised the prospect of batch fabrication high performance sensors with low cost and small size, many researchers have investigated the micromachined gyroscope which is expected to rapidly grow in the automotive and consumer market. This paper proposes a vibrating wheel gyroscope developed by a bulk silicon dissolved wafer process. The dimension of movable elements is designed as φ 1.2 mm×0.015 mm and the FEM simulation results are provided. The fabrication sequence is introduced and the key technique of high aspect ratio trenches etching is introduced. Primary test results show that this kind of micromachined gyroscope would satisfy the requirements of trade market
  • Keywords
    elemental semiconductors; finite element analysis; gyroscopes; integrated circuit technology; micromachining; microsensors; silicon; sputter etching; 0.015 mm; 1.2 mm; FEM simulation; Si; Si wafer dissolved vibrating gyroscope; automotive market; batch fabrication; bulk Si dissolved wafer process; consumer market; etching; fabrication sequence; micromachined gyroscope; micromachining; vibrating wheel gyroscope; Automotive engineering; Costs; Fabrication; Gyroscopes; Micromachining; Silicon; Stators; Testing; Torque; Wheels;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Instrumentation and Measurement Technology Conference, 1998. IMTC/98. Conference Proceedings. IEEE
  • Conference_Location
    St. Paul, MN
  • ISSN
    1091-5281
  • Print_ISBN
    0-7803-4797-8
  • Type

    conf

  • DOI
    10.1109/IMTC.1998.676900
  • Filename
    676900