DocumentCode :
1590739
Title :
Investigation of the burn-in effect in microwave GaInP/GaAs HBTs by means of numerical simulations
Author :
Rusani, A. ; Kuchenbecker, J. ; Norgarino, M. ; Plana, R. ; Graffeuil, J. ; Vanzi, M.
Author_Institution :
DIEE, Cagliari Univ., Italy
fYear :
1999
fDate :
6/21/1905 12:00:00 AM
Firstpage :
260
Lastpage :
265
Abstract :
GaInP/GaAs HBTs demonstrate outstanding long-term reliability performance. Nevertheless they still suffer from a short-term DC current gain instability, known as the burn-in effect. Even if the effect is usually attributed to hydrogen contamination passivating the carbon atoms employed as base dopant, the underlying physical mechanism is still unclear. The present work addresses the burn-in effect by means of numerical simulations performed with the device simulation software BLAZE by Silvaco. The results give support to the hypothesis that the burn-in effect is a surface related phenomenon. The simulations reveal that a fixed surface charge located near the edge of the emitter mesa should be introduced. The work points out also that simultaneous variations of both this charge and of the surface recombination velocity should be taken into account. This simulation approach could be a useful tool, in order to develop a chemical/physical model of the burn-in effect
Keywords :
III-V semiconductors; electronic engineering computing; gallium arsenide; gallium compounds; heterojunction bipolar transistors; indium compounds; microwave bipolar transistors; passivation; semiconductor device models; semiconductor device reliability; surface recombination; surface states; BLAZE; C base dopant; GaInP-GaAs:C; H contamination passivation; burn-in effect; chemical/physical model; device simulation software; emitter mesa; fixed surface charge; long-term reliability performance; microwave GaInP/GaAs HBTs; numerical simulations; short-term DC current gain instability; surface recombination velocity; surface related phenomenon; Atomic layer deposition; Contamination; Current density; Electrons; Gallium arsenide; Heterojunction bipolar transistors; Hydrogen; Numerical simulation; Temperature; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
High Performance Electron Devices for Microwave and Optoelectronic Applications, 1999. EDMO. 1999 Symposium on
Conference_Location :
London
Print_ISBN :
0-7803-5298-X
Type :
conf
DOI :
10.1109/EDMO.1999.821495
Filename :
821495
Link To Document :
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