DocumentCode
159303
Title
Optical isolator with amorphous silicon waveguide core on magneto-optical garnet
Author
Miura, Kiyotaka ; Hirasawa, T. ; Kang, Jiawen ; Shoji, Yozo ; Okada, Yoshitaka ; Yokoi, Hiroshi ; Nishiyama, Naoto ; Arai, Shigehisa ; Mizumoto, Tetsuya
Author_Institution
Dept. of Electr. & Electron. Eng., Tokyo Inst. of Technol., Tokyo, Japan
fYear
2014
fDate
27-29 Aug. 2014
Firstpage
116
Lastpage
117
Abstract
An optical isolator is fabricated with an amorphous silicon waveguide core deposited using a plasma-enhanced chemical-vapor-deposition technique on a magneto-optical garnet Ce:YIG. An isolation ratio of 17 dB is demonstrated.
Keywords
amorphous semiconductors; cerium; elemental semiconductors; garnets; magneto-optical isolators; optical fabrication; optical waveguides; plasma CVD; silicon; yttrium compounds; Si-Y3IG; amorphous silicon waveguide core; isolation ratio; magneto-optical garnet; optical isolator; plasma-enhanced chemical-vapor-deposition technique; Isolators; Magnetooptic effects; Optical amplifiers; Optical device fabrication; Optical feedback; Optical interferometry; Optical waveguides;
fLanguage
English
Publisher
ieee
Conference_Titel
Group IV Photonics (GFP), 2014 IEEE 11th International Conference on
Conference_Location
Paris
Print_ISBN
978-1-4799-2282-6
Type
conf
DOI
10.1109/Group4.2014.6961954
Filename
6961954
Link To Document