DocumentCode
1597626
Title
Measurement of the sheath surrounding a planar electron emitting surface in the afterglow of an RF plasma
Author
Sheehan, J.P. ; Barnat, E.V. ; Weatherford, B.R. ; Hershkowitz, Noah
Author_Institution
Univ. of Michigan, Ann Arbor, MI, USA
fYear
2013
Firstpage
1
Lastpage
1
Abstract
Summary form only given. The potential of a sheath surrounding a planar, electron emitting cathode was measured in the afterglow of a capacitively coupled RF plasma. Using Langmuir and emissive probes, the electron temperature and plasma potential were measured as a function of time. The inflection point in the limit of zero emission, a highly accurate emissive probe technique to measure the plasma potential, was used to make time resolved measurements for the first time. Measurements showed that as the plasma electron temperature cooled, approaching the emitted electron temperature, the emissive sheath potential shrank to zero. These results were in good qualitative agreement with a new theory of emissive sheaths, but deviations at intermediate temperature ratios indicate that the behavior of the emissive sheath is not yet fully understood.
Keywords
Langmuir probes; afterglows; cathodes; plasma sheaths; plasma temperature; plasma transport processes; Langmuir probes; capacitively coupled RF plasma afterglow; electron emitting cathode; emissive probes; emissive sheath potential; emitted electron temperature; inflection point; planar electron emitting surface; plasma electron temperature; plasma potential; sheath measurement; time resolved measurements;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location
San Francisco, CA
ISSN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2013.6635042
Filename
6635042
Link To Document