Title :
Enhancement of neon soft x-rays emission from 200 J plasma focus device for application in soft x-ray lithography
Author :
Kalaiselvi, S.M.P. ; Tan, T.L. ; Talebitaher, A. ; Lee, P. ; Rawat, R.S.
Author_Institution :
Plasma Radiat. Source Lab., Nanyang Technol. Univ., Singapore, Singapore
Abstract :
Summary form only given. The neon soft X-ray (SXR) emission characteristics of a Fast Miniature Plasma Focus (FMPF-3) device have been investigated. The FMPF-3 device used for our experiment is of sub-kilojoule (100-240 J) energy capacity, which is an order of magnitude lesser than the other well established plasma focus devices on which most of the neon x-ray emission studies have been performed. A detailed investigation on the influence of different geometrical parameters of the anode, the pressure of the filling gas and high-Z gas admixture on the SXR emission was done to optimize the neon SXR yield from FMPF-3 and there-by make it a potential source for soft X-ray lithography. The highest SXR yield of 1.2 J/shot, corresponding to a wall plug efficiency of 0.6 %, was obtained for 20 mm long tapered stainless steel anode.
Keywords :
X-ray lithography; gas mixtures; neon; plasma diagnostics; plasma focus; stainless steel; FMPF-3 device; Ne; SXR emission; energy 100 J to 240 J; fast miniature plasma focus device; geometrical parameters; high-Z gas admixture; neon soft X-ray emission characteristics; plasma focus device; size 20 mm; sofT X-ray lithography; stainless steel anode; wall plug efficiency; Anodes; Educational institutions; Laboratories; Performance evaluation; Plasmas; X-ray lithography; X-rays;
Conference_Titel :
Plasma Science (ICOPS), 2013 Abstracts IEEE International Conference on
Conference_Location :
San Francisco, CA
DOI :
10.1109/PLASMA.2013.6635141
