• DocumentCode
    1607643
  • Title

    Development of PLZT films on base-metal foils by chemical solution deposition

  • Author

    Ma, B. ; Kwon, D.K. ; Narayanan, M. ; Balachandran, U.

  • Author_Institution
    Energy Systems Division, Argonne National Laboratory, IL 60439, USA
  • Volume
    3
  • fYear
    2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    Thin films of Pb0.92La0.08Zr0.52Ti0.48O3 were deposited on Ni foils by chemical solution deposition to form film-on-foil capacitors with high dielectric constant. These capacitors can be embedded into printed wire boards. We measured dielectric constants of 1300 (at 25??C) and 1800 (at 150??C), as well as leakage current densities ??6.6 ?? 10??9 (at 25??C) and 1.4 ?? 10-8 A/cm2 (at 150??C), breakdown field strength >1.4 MV/cm, and energy density of 16.5 J/cm3.
  • Keywords
    Capacitors; Chemicals; Current measurement; Density measurement; Dielectric measurements; Dielectric thin films; Energy measurement; High-K gate dielectrics; Sputtering; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2008. ISAF 2008. 17th IEEE International Symposium on the
  • Conference_Location
    Santa Re, NM, USA
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-2744-4
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2008.4693866
  • Filename
    4693866
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1607643