• DocumentCode
    1608528
  • Title

    AlGaN/GaN HEMT on Si (111) substrate for millimeter microwave power applications

  • Author

    Bouzid, S. ; Hoel, V. ; Defrance, N. ; Maher, H. ; Lecourt, F. ; Renvoise, M. ; Smith, D. ; De Jaeger, J.C.

  • Author_Institution
    IEMN (Inst. d´´Electron., de Microelectron. et de Nanotechnol.), Lille Univ., Villeneuve-d´´Ascq, France
  • fYear
    2010
  • Firstpage
    111
  • Lastpage
    114
  • Abstract
    This paper reports the capability of AlGaN/GaN HEMTs on Si (111) substrates for microwave power applications above 30 GHz. A current gain cut-off frequency ft=90 GHz and a maximum power gain cut-off frequency fmax=135 GHz are obtained for a 80 nm gate-length transistor. These results, associated with low lag effects, demonstrate the capability of these transistors for high performance, cost effective, MMIC fabrication on a Si substrate for high frequency microwave power applications.
  • Keywords
    aluminium compounds; gallium compounds; millimetre wave power transistors; silicon; AlGaN-GaN; HEMT; MMIC fabrication; frequency 135 GHz; frequency 90 GHz; gain cut-off frequency; gate-length transistor; millimeter microwave power applications; Aluminum gallium nitride; Cutoff frequency; Gallium nitride; HEMTs; Logic gates; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Semiconductor Devices & Microsystems (ASDAM), 2010 8th International Conference on
  • Conference_Location
    Smolenice
  • Print_ISBN
    978-1-4244-8574-1
  • Type

    conf

  • DOI
    10.1109/ASDAM.2010.5666316
  • Filename
    5666316