• DocumentCode
    1608753
  • Title

    Relationship between defects and the dielectric and transport properties of SrTiO3 thin films

  • Author

    Son, J. ; Cagnon, J. ; Finstrom, N.H. ; Boesch, D.S. ; Lu, J.W. ; Stemmer, S.

  • Author_Institution
    Materials Department, University of California, Santa Barbara, 93106-5050, USA
  • Volume
    1
  • fYear
    2008
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We report on some of the key properties of ferroelectric and high-permittivity thin films relevant for their application in metal/insulator/metal structures, such as voltage tunable capacitors and novel memories. We use a model system, Pt/SrTiO3/Pt thin film structures, with microstructures, stress states and point defects characterized by advanced transmission electron microscopy techniques, high-resolution x-ray diffraction and wafer curvature measurements. We investigate the relation between defects and dielectric properties, measured at frequencies up to 1 GHz. We discuss the origins of dielectric losses in these films and the role of point defects, such as oxygen vacancies. We report on dielectric deadlayers, which cause a significant reduction in the dielectric tunabilities. We discuss the influence of dielectric relaxation on the thermal leakage characteristics of textured and epitaxial Pt/SrTiO3/Pt thin film structures. We also discuss the properties of Pt/SrTiO3/Pt structures with ultrathin (5 ?? 10 nm) SrTiO3 films.
  • Keywords
    Capacitors; Dielectric losses; Dielectric measurements; Dielectric thin films; Dielectrics and electrical insulation; Ferroelectric materials; Metal-insulator structures; Microstructure; Semiconductor device modeling; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2008. ISAF 2008. 17th IEEE International Symposium on the
  • Conference_Location
    Santa Re, NM, USA
  • ISSN
    1099-4734
  • Print_ISBN
    978-1-4244-2744-4
  • Electronic_ISBN
    1099-4734
  • Type

    conf

  • DOI
    10.1109/ISAF.2008.4693915
  • Filename
    4693915