Title :
Neural networks for advanced process control
Author :
Mevawalla, Z.N. ; May, G.S. ; Kiehlbauch, M.W.
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Abstract :
The fabrication of integrated circuits involves many non-linear processes, each with several inputs and outputs. These complexities suggest that benefits could be derived from the development and implementation of advanced process control tools and strategies. Empirical process models are one of these tools. In this research, sequential neural network models were developed to characterize critical steps in a fabrication process. The data used were collected from an industrial process, a distinguishing feature of this research. Typically the data used to train neural network models comes from designed (factorial) experiments. Here, the data came from experiments related to the processes under investigation, but not specifically designed to generate data for modeling. The models performed well demonstrating the flexibility of the sequential neural network modeling process. Additionally, the models were used in a sensitivity analysis to study the output response to the various inputs. Future work will include using the models as part of a model-based supervisory control system.
Keywords :
integrated circuits; neurocontrollers; process control; semiconductor device manufacture; sensitivity analysis; advanced process control; data generation; industrial process; integrated circuits fabrication; model based supervisory control system; nonlinear process; sequential neural network model; Artificial neural networks; Containers; Data models; Integrated circuit modeling; Neurons; Object oriented modeling; Semiconductor device modeling;
Conference_Titel :
Advanced Semiconductor Manufacturing Conference (ASMC), 2010 IEEE/SEMI
Conference_Location :
San Francisco, CA
Print_ISBN :
978-1-4244-6517-0
DOI :
10.1109/ASMC.2010.5551439