DocumentCode
161669
Title
A high density Twin-Gate OTP cell in pure 28nm CMOS process
Author
Woan Yun Hsiao ; Chin Yu Mei ; Wen Chao Shen ; Tzong Sheng Chang ; Yue Der Chih ; Ya-Chin King ; Chrong Jung Lin
Author_Institution
Inst. of Electron. Eng., Nat. Tsing-Hua Univ., Hsinchu, Taiwan
fYear
2014
fDate
28-30 April 2014
Firstpage
1
Lastpage
2
Abstract
A high density high-k gate dielectric breakdown OTP cell with a self-aligned twin-gate isolation in pure 28nm HKMG process is demonstrated. With a merged spacer isolation formed by two tiny metal gates, the OTP cells can be well isolated with an ultra small cell size of 0.0441μm2 in pure 28nm CMOS logic process. The Twin-Gate OTP memory adopts low voltage high-k dielectric breakdown mechanism to obtain 104 times of On/Off ratio by a low program voltage of 4V in 20μs. A tiny and excellent Twin-Gate isolation with wide program and temperature margins has been successfully achieved in this OTP cell. Superior disturbs immunity and data retention further support the new logic OTP cell to be a promising solution in advanced logic NVM applications.
Keywords
CMOS logic circuits; electric breakdown; high-k dielectric thin films; low-power electronics; CMOS logic process; CMOS process; HKMG process; advanced logic NVM applications; data retention; high density high-k gate dielectric breakdown OTP cell; high density twin-gate OTP cell; logic OTP cell; low voltage high-k dielectric breakdown mechanism; on-off ratio; one-time programmable memories; self-aligned twin-gate isolation; size 28 nm; spacer isolation; temperature margins; time 20 mus; tiny metal gates; twin-gate OTP memory; twin-gate isolation; voltage 4 V; Abstracts; CMOS integrated circuits; CMOS technology; Electric breakdown; Logic gates; Reliability; Stress;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Technology, Systems and Application (VLSI-TSA), Proceedings of Technical Program - 2014 International Symposium on
Conference_Location
Hsinchu
Type
conf
DOI
10.1109/VLSI-TSA.2014.6839664
Filename
6839664
Link To Document