DocumentCode :
1618860
Title :
Evaluation of BJTS as Closing Switch of Miniaturized Marx Generator
Author :
Yamada, Chikatoshi ; Ueno, Tomohiro ; Namihira, Takao ; Sakugawa, Takashi ; Katsuki, S.
Author_Institution :
Kumamoto Univ., Kumamoto
fYear :
2007
Firstpage :
361
Lastpage :
361
Abstract :
Summary form only given. The micro plasma technology is used in various fields such as processing or chemical analysis of minute material, short-wavelength light source, and plasma function device. The plasmas can be generated by either an electron beam or electric discharge. The pulsed voltage, which is necessary to generate these plasmas, is about 3 kV and required energy is typically in the low 3-10 mJ range. The miniaturized generator has been used to produce these plasmas in the micro-scale area. For such background, the miniaturized Marx generator which has bipolar junction transistors (BJTs) as closing switches has been developed to generate micro plasmas . In the miniaturized Marx generator, BJT´s are operated in avalanche mode to obtain a faster switching speed with ns order. In this paper, three kinds of BJTs which have ditferent collector current each others are evaluated as closing switch. In the experiment, the BJTs are operated in avalanche mode with higher applied voltage (about twice voltage rating) into the between collector and emitter of BJTs. As the result, the closing time of BJTs in the avalanche mode is constant regardless of the value of applied voltage. And, the characteristics of maximum current and maximum repetition rate in the avalanche mode operations of three kinds of BJTs are almost the same.
Keywords :
bipolar transistors; discharges (electric); plasma devices; plasma production; pulse generators; pulsed power supplies; pulsed power switches; avalanche mode; bipolar junction transistors; chemical analysis; closing switch; collector current; electric discharge; electron beam; micro plasma technology; miniaturized Marx generator; plasma function device; plasma materials processing; short-wavelength light source; Chemical analysis; Chemical technology; Electron beams; Light sources; Plasma chemistry; Plasma devices; Plasma materials processing; Plasma sources; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 2007. ICOPS 2007. IEEE 34th International Conference on
Conference_Location :
Albuquerque, NM
ISSN :
0730-9244
Print_ISBN :
978-1-4244-0915-0
Type :
conf
DOI :
10.1109/PPPS.2007.4345667
Filename :
4345667
Link To Document :
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