• DocumentCode
    1620125
  • Title

    An efficient full-chip ESD paths resistance value verification flow for large scale designs

  • Author

    Meng-Fan Wu ; Chun-Chien Tsai ; Jen-Chou Tseng ; Chao, Roger ; Ming-Hsiang Song ; Yi-Kan Cheng

  • Author_Institution
    Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan
  • fYear
    2013
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    Commercial EDA tools are available to verify resistance values of ESD paths. However, since ESD paths relate to whole-chip power/ground (P/G) nets, state-of-the-art commercial resistance extraction tools may result in memory overflow issues when the complexity of P/G nets is too high. The latest 28 nm real products exhibit such issues. This paper presents an efficient flow which solves this issue.
  • Keywords
    circuit complexity; electric resistance; electrostatic discharge; power semiconductor devices; P/G nets complexity; commercial EDA tools; commercial resistance extraction tools; full-chip ESD paths resistance value verification flow; large scale designs; memory overflow; size 28 nm; whole-chip power/ground nets; Electrostatic discharges; Immune system; Integrated circuit interconnections; Layout; Metals; Resistance; Runtime;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electrical Overstress/Electrostatic Discharge Symposium (EOS/ESD), 2013 35th
  • Conference_Location
    Las Vegas, NV
  • ISSN
    0739-5159
  • Type

    conf

  • Filename
    6635947