• DocumentCode
    1629308
  • Title

    Improve variability in carbon nanotube FETs by scaling

  • Author

    Sun, Yanning ; Tuleski, George ; Han, Shu-Jen ; Haensch, Wilfried ; Chen, Zhihong

  • Author_Institution
    IBM T.J. Watson Res. Center, Yorktown Heights, NY, USA
  • fYear
    2010
  • Firstpage
    283
  • Lastpage
    284
  • Abstract
    Carbon nanotube transistors are shown to have large performance variation due to their diameter variation, which is not acceptable to VLSI technology. We demonstrate that by proper scaling we can reach >2 mA/μm on-state current in 90% of our nanotube devices. More importantly, we demonstrate proper scaling can reduce the current variation by 2 orders of magnitude and mitigate the impact of tube diameter distribution.
  • Keywords
    VLSI; carbon nanotubes; field effect transistors; nanotube devices; VLSI technology; carbon nanotube FET; carbon nanotube transistors; field-effect transistors; nanotube devices; tube diameter distribution; CNTFETs; Logic gates; Nanoscale devices; Nanotubes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2010
  • Conference_Location
    South Bend, IN
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-4244-6562-0
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2010.5551959
  • Filename
    5551959