Title :
Micro-bias-tees using micromachined flip-chip inductors
Author :
Bell, Patrick J. ; Bright, V.M. ; Popovic, Zoya
Author_Institution :
Dept. of Electr. Eng., Colorado Univ., Boulder, CO, USA
Abstract :
In order to reduce the circuit area required by bias-tees in active circuits, an approach using a micromachined suspended inductor is presented in this paper. The inductor is fabricated using a commercial silicon micromachining process and then integrated with a microwave circuit using flip-chip assembly. Suspending the inductor above the substrate greatly reduces the parasitic capacitances associated with the substrate. The inductor has a measured self-resonant frequency of 18 GHz. A tethered approach allows "pre-releasing" of the structure, which makes integration possible on any substrate. 4-mm/sup 2/ bias-tees on both alumina and TMM6 substrates are presented in this work with comparable performance to commercially available bias-tees, but with a significant reduction in circuit area.
Keywords :
flip-chip devices; inductors; micromachining; 18 GHz; Al/sub 2/O/sub 3/; Si; TMM6 substrate; active microwave circuit; alumina substrate; flip-chip assembly; micro-bias-tee; micromachined suspended inductor; parasitic capacitance; self-resonant frequency; silicon micromachining process; Active inductors; Circuits; Gold; Impedance; Micromachining; Micromechanical devices; Microwave devices; Radio frequency; Silicon; Wafer bonding;
Conference_Titel :
Microwave Symposium Digest, 2003 IEEE MTT-S International
Conference_Location :
Philadelphia, PA, USA
Print_ISBN :
0-7803-7695-1
DOI :
10.1109/MWSYM.2003.1210983