DocumentCode :
1635215
Title :
Study on polysilicon extended gate field effect transistor with samarium oxide sensing membrane
Author :
Kao, Chyuan-Haur ; Chen, Hsian ; Chen, Kung Shao ; Huang, Chuan-Yu ; Huang, Ching-Hua ; Ou, Jiun-Cheng ; Lin, Chih Ju ; Lin, Keng Min ; Kuo, Lien Tai
Author_Institution :
Dept. of Electron. Eng., Chang Gung Univ., Taoyuan, Taiwan
fYear :
2010
Firstpage :
1425
Lastpage :
1427
Abstract :
The first material of silicon dioxide (SiO2) had been proposed as a chemical transducer element of pH sensitive membrane around the early of 1970s. In 1981 Matsuo et al. proposed Ta2O5 as pH sensing membrane. Start from that moment, many materials have been wildly investigated, e.g. Al2O3, SnO2, WO3. The rare -earth oxide, Samarium oxide (Sm2O3), is an attractive material to substitute the previous high-k materials because of its high dielectric constant(15-30) and good chemical and thermal stability with Si material. In this paper, the electrical and physical characteristics of the high-k Sm2O3 polyoxides by RF sputtering system deposited on the polycrystalline silicon were studied. It can be seen that the high-k Sm2O3 polyoxides with post rapid thermal annealing (RTA) can show lower trapping rates and higher dielectric breakdown fields. Furthermore, the EGFET device with a high-k Sm2O3 sensing membrane deposited on polysilicon through reactive sputtering was proposed for high sensitive pH sensing.
Keywords :
electric breakdown; field effect transistors; membranes; rapid thermal annealing; samarium compounds; sputter deposition; Sm2O3; chemical stability; chemical transducer element; dielectric breakdown field; pH sensing membrane; pH sensitive membrane; polycrystalline silicon; polysilicon extended gate field effect transistor; rapid thermal annealing; rare-earth oxide; reactive sputtering; samarium oxide sensing membrane; sensitive pH sensing; silicon dioxide; thermal stability; Annealing; Films; High K dielectric materials; Logic gates; Temperature sensors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-5797-7
Type :
conf
DOI :
10.1109/ICSICT.2010.5667585
Filename :
5667585
Link To Document :
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