DocumentCode
1638240
Title
The effects of vacuum spacer transistors between high performance and low stand-by power devices beyond 16nm
Author
Park, Jemin ; Hu, Chenming
Author_Institution
Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
fYear
2010
Firstpage
1823
Lastpage
1825
Abstract
The vacuum spacer transistors are compared with the conventional oxide spacer transistors in both high performance device and low standby power device. In high performance device case, with 14nm vacuum spacers, the CMOS inverter delay, switching charge, and switching energy are reduced by 6.6%, 15.6%, and 19.1%, respectively, compared to oxide spacer. In low standby power device case, with 18nm vacuum spacers, the inverter delay is increased by 10% compared to oxide spacer due to the degradation of on-current.
Keywords
CMOS integrated circuits; invertors; power transistors; CMOS inverter delay; oxide spacer transistors; stand-by power devices; switching charge; switching energy; vacuum spacer transistors; Elementary particle vacuum; Inverters; Logic gates; MOSFETs; Performance evaluation; Switches;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State and Integrated Circuit Technology (ICSICT), 2010 10th IEEE International Conference on
Conference_Location
Shanghai
Print_ISBN
978-1-4244-5797-7
Type
conf
DOI
10.1109/ICSICT.2010.5667690
Filename
5667690
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