Title :
Characterization of junction capacitance parameters for Gaussian/constant doping profiles
Author_Institution :
Dept. of Electr. Eng., Portland State Univ., OR, USA
Abstract :
A new model for the junction capacitance parameters for junctions that can be described by a Gaussian/constant doping profile is presented. The model relies on accurate approximations for the error function and its integral. On the basis of these approximations, routines which accurately predict the built-in potential of the junction and the zero-bias junction capacitances for a wide range of junction parameters have been constructed. Values of the built-in potential, zero-bias capacitance, and capacitance versus voltage characteristics for typical junction parameters are shown
Keywords :
capacitance; doping profiles; semiconductor junctions; Gaussian/constant doping profile; accurate error function approximations; accurate integral approximations; built-in junction potential; capacitance versus voltage characteristics; junction capacitance parameter characterization; model; semiconductor; wide junction parameter range; zero-bias junction capacitances; Capacitance; Doping profiles; Gaussian distribution; Gaussian processes; Integral equations; Poisson equations; Semiconductor device doping; Semiconductor process modeling; Silicon; Space charge;
Conference_Titel :
Circuits and Systems, 1989., IEEE International Symposium on
Conference_Location :
Portland, OR
DOI :
10.1109/ISCAS.1989.100485