• DocumentCode
    164160
  • Title

    Capacitance of back-gated nanowires in various dielectric embeddings

  • Author

    Boldeiu, George ; Moagar-Poladian, Victor ; Sandu, Titus

  • Author_Institution
    Nat. Inst. for R&D in Microtechnol. (IMT), Bucharest, Romania
  • fYear
    2014
  • fDate
    13-15 Oct. 2014
  • Firstpage
    273
  • Lastpage
    276
  • Abstract
    The effect of dielectric embedding on the capacitance of back-gated nanowires can be accurately captured as an effective dielectric constant that depends solely on the difference between the nanowire-gate distance and the dielectric thickness. When used for sensing purposes this property provides the maximum sensitivity within a range of two diameters around the center of the nanowire.
  • Keywords
    nanowires; permittivity; back-gated nanowire capacitance; dielectric embeddings; dielectric thickness; effective dielectric constant; nanowire center; nanowire-gate distance; Capacitance; Dielectrics; Electric potential; Field effect transistors; Logic gates; Nanowires; Sensors; capacitance; carrier m obility; field effect transistor; semiconductor nanowire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Conference (CAS), 2014 International
  • Conference_Location
    Sinaia
  • ISSN
    1545-827X
  • Print_ISBN
    978-1-4799-3916-9
  • Type

    conf

  • DOI
    10.1109/SMICND.2014.6966458
  • Filename
    6966458