DocumentCode
164160
Title
Capacitance of back-gated nanowires in various dielectric embeddings
Author
Boldeiu, George ; Moagar-Poladian, Victor ; Sandu, Titus
Author_Institution
Nat. Inst. for R&D in Microtechnol. (IMT), Bucharest, Romania
fYear
2014
fDate
13-15 Oct. 2014
Firstpage
273
Lastpage
276
Abstract
The effect of dielectric embedding on the capacitance of back-gated nanowires can be accurately captured as an effective dielectric constant that depends solely on the difference between the nanowire-gate distance and the dielectric thickness. When used for sensing purposes this property provides the maximum sensitivity within a range of two diameters around the center of the nanowire.
Keywords
nanowires; permittivity; back-gated nanowire capacitance; dielectric embeddings; dielectric thickness; effective dielectric constant; nanowire center; nanowire-gate distance; Capacitance; Dielectrics; Electric potential; Field effect transistors; Logic gates; Nanowires; Sensors; capacitance; carrier m obility; field effect transistor; semiconductor nanowire;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Conference (CAS), 2014 International
Conference_Location
Sinaia
ISSN
1545-827X
Print_ISBN
978-1-4799-3916-9
Type
conf
DOI
10.1109/SMICND.2014.6966458
Filename
6966458
Link To Document