Using 0-dimensional silica to control diameter and density of carbon nanotubes

Author

Yucui Wu ; Min Zhang ; Mansun Chan

Author_Institution

Sch. of Electron. & Comput. Eng., Peking Univ., Shenzhen, China

fYear

2014

fDate

18-21 Aug. 2014

Firstpage

655

Lastpage

658

Abstract

A simple and effective method to control the growth of carbon nanotubes (CNTs) by introducing 0-dimensional silica particles has been proposed and demonstrated. After being processed with dip-coating and self-assembly of the specific silica nanoparticles, the substrate surface with nano-scale morphology was obtained, and which helped to control the diameters and density during the CNTs growth in a Plasma Enhanced Chemical Vapor Deposition system. This method improved both diameter distribution and wall number distribution of the CNTs. The CNT density has reached about 6.4×1011 cm^-2. The relation between the nanoparticle size and the CNTs´ physical properties has also been explored.

Keywords

carbon nanotubes; dip coating; nanofabrication; nanoparticles; particle size; plasma CVD; self-assembly; silicon compounds; surface morphology; 0-dimensional silica nanoparticles; C-SiO₂; carbon nanotube density; carbon nanotube diameter; carbon nanotube growth; diameter distribution; dip coating; nanoparticle size; nanoscale morphology; physical properties; plasma enhanced chemical vapor deposition; self-assembly; substrate surface; wall number distribution; Carbon nanotubes; Morphology; Nanoparticles; Silicon; Silicon compounds; Substrates; Surface morphology;

fLanguage

English

Publisher

ieee

Conference_Titel

Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on

Conference_Location

Toronto, ON

Type

conf

DOI

10.1109/NANO.2014.6967971

Filename

6967971