DocumentCode :
165451
Title :
Using 0-dimensional silica to control diameter and density of carbon nanotubes
Author :
Yucui Wu ; Min Zhang ; Mansun Chan
Author_Institution :
Sch. of Electron. & Comput. Eng., Peking Univ., Shenzhen, China
fYear :
2014
fDate :
18-21 Aug. 2014
Firstpage :
655
Lastpage :
658
Abstract :
A simple and effective method to control the growth of carbon nanotubes (CNTs) by introducing 0-dimensional silica particles has been proposed and demonstrated. After being processed with dip-coating and self-assembly of the specific silica nanoparticles, the substrate surface with nano-scale morphology was obtained, and which helped to control the diameters and density during the CNTs growth in a Plasma Enhanced Chemical Vapor Deposition system. This method improved both diameter distribution and wall number distribution of the CNTs. The CNT density has reached about 6.4×1011 cm-2. The relation between the nanoparticle size and the CNTs´ physical properties has also been explored.
Keywords :
carbon nanotubes; dip coating; nanofabrication; nanoparticles; particle size; plasma CVD; self-assembly; silicon compounds; surface morphology; 0-dimensional silica nanoparticles; C-SiO2; carbon nanotube density; carbon nanotube diameter; carbon nanotube growth; diameter distribution; dip coating; nanoparticle size; nanoscale morphology; physical properties; plasma enhanced chemical vapor deposition; self-assembly; substrate surface; wall number distribution; Carbon nanotubes; Morphology; Nanoparticles; Silicon; Silicon compounds; Substrates; Surface morphology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location :
Toronto, ON
Type :
conf
DOI :
10.1109/NANO.2014.6967971
Filename :
6967971
Link To Document :
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