DocumentCode
165523
Title
High conformity sidewall ZnO nanorods via hydrothermal method
Author
Yu-Zhong Lin ; Hao-Yu Wu ; Yu-Wen Cheng ; Ching-Fuh Lin
Author_Institution
Grad. Inst. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear
2014
fDate
18-21 Aug. 2014
Firstpage
390
Lastpage
391
Abstract
High conformity sidewall ZnO nanorods are manufactured on etched Si by hydrothermal method. The temperature is fixed at 90 degree Celsius. The morphology of ZnO nanorods is examined by scanning electron microscopy. Also, the results show that we successfully spin coat ZnO seed layer on the sidewalls of grooves. Moreover, ZnO nanorods are grown in grooves of etched Si substrate.
Keywords
II-VI semiconductors; nanofabrication; nanorods; scanning electron microscopy; semiconductor growth; spin coating; sputter etching; wide band gap semiconductors; zinc compounds; ZnO; etched Si substrate; high conformity sidewall ZnO nanorod; hydrothermal method; nanorod morphology; scanning electron microscopy; spin coated seed layer; temperature 90 degC; Gallium nitride; Light emitting diodes; Molecular beam epitaxial growth; Scanning electron microscopy; Silicon; Substrates; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location
Toronto, ON
Type
conf
DOI
10.1109/NANO.2014.6968006
Filename
6968006
Link To Document