Title :
High conformity sidewall ZnO nanorods via hydrothermal method
Author :
Yu-Zhong Lin ; Hao-Yu Wu ; Yu-Wen Cheng ; Ching-Fuh Lin
Author_Institution :
Grad. Inst. of Electr. Eng., Nat. Taiwan Univ., Taipei, Taiwan
Abstract :
High conformity sidewall ZnO nanorods are manufactured on etched Si by hydrothermal method. The temperature is fixed at 90 degree Celsius. The morphology of ZnO nanorods is examined by scanning electron microscopy. Also, the results show that we successfully spin coat ZnO seed layer on the sidewalls of grooves. Moreover, ZnO nanorods are grown in grooves of etched Si substrate.
Keywords :
II-VI semiconductors; nanofabrication; nanorods; scanning electron microscopy; semiconductor growth; spin coating; sputter etching; wide band gap semiconductors; zinc compounds; ZnO; etched Si substrate; high conformity sidewall ZnO nanorod; hydrothermal method; nanorod morphology; scanning electron microscopy; spin coated seed layer; temperature 90 degC; Gallium nitride; Light emitting diodes; Molecular beam epitaxial growth; Scanning electron microscopy; Silicon; Substrates; Zinc oxide;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location :
Toronto, ON
DOI :
10.1109/NANO.2014.6968006
