DocumentCode
165669
Title
Double grating antireflection nanostructure based on nano-cone
Author
Xiaoting Zhi ; Chuanhong Liu ; Fengyun Zhao ; Yucui Wu ; Min Zhang ; Zhaoyu Zhang
Author_Institution
Shenzhen Grad. Sch., Sch. of Electron. & Comput. Eng., Peking Univ., Shenzhen, China
fYear
2014
fDate
18-21 Aug. 2014
Firstpage
337
Lastpage
340
Abstract
A type of half-embedded cone grating nanostructure is proposed for antireflection (AR). It can achieve reflectance of down to 0.5% under normal incidence and 6% under incidence angle as large as 40 degrees in the 300-1100 nm wavelength range. Besides, it can maintain good performance in a large dimension range with a fixed period or vertex angle. Furthermore, the refractive index of the grating can be varied in a large range while keeping the high antireflective ability, namely that the material of the grating can be freely chosen without the limitation of single material. More importantly, it can tolerates the interlayer between the double cone grating much with just a slightly fluctuation of the reflectance less than 0.03%. These properties reduce both the design difficulty and the fabrication difficulty, making it a potential solution for use in various applications such as renewable energy and optical-electro devices.
Keywords
diffraction gratings; electro-optical devices; nanophotonics; refractive index; double grating antireflection nanostructure; half-embedded cone grating nanostructure; nanocone; optical-electro devices; refractive index; renewable energy devices; wavelength 300 nm to 1100 nm; Gratings; Photovoltaic cells; Reflectivity; Refractive index; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
Conference_Location
Toronto, ON
Type
conf
DOI
10.1109/NANO.2014.6968084
Filename
6968084
Link To Document