• DocumentCode
    165669
  • Title

    Double grating antireflection nanostructure based on nano-cone

  • Author

    Xiaoting Zhi ; Chuanhong Liu ; Fengyun Zhao ; Yucui Wu ; Min Zhang ; Zhaoyu Zhang

  • Author_Institution
    Shenzhen Grad. Sch., Sch. of Electron. & Comput. Eng., Peking Univ., Shenzhen, China
  • fYear
    2014
  • fDate
    18-21 Aug. 2014
  • Firstpage
    337
  • Lastpage
    340
  • Abstract
    A type of half-embedded cone grating nanostructure is proposed for antireflection (AR). It can achieve reflectance of down to 0.5% under normal incidence and 6% under incidence angle as large as 40 degrees in the 300-1100 nm wavelength range. Besides, it can maintain good performance in a large dimension range with a fixed period or vertex angle. Furthermore, the refractive index of the grating can be varied in a large range while keeping the high antireflective ability, namely that the material of the grating can be freely chosen without the limitation of single material. More importantly, it can tolerates the interlayer between the double cone grating much with just a slightly fluctuation of the reflectance less than 0.03%. These properties reduce both the design difficulty and the fabrication difficulty, making it a potential solution for use in various applications such as renewable energy and optical-electro devices.
  • Keywords
    diffraction gratings; electro-optical devices; nanophotonics; refractive index; double grating antireflection nanostructure; half-embedded cone grating nanostructure; nanocone; optical-electro devices; refractive index; renewable energy devices; wavelength 300 nm to 1100 nm; Gratings; Photovoltaic cells; Reflectivity; Refractive index; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2014 IEEE 14th International Conference on
  • Conference_Location
    Toronto, ON
  • Type

    conf

  • DOI
    10.1109/NANO.2014.6968084
  • Filename
    6968084