• DocumentCode
    1656705
  • Title

    Low-temperature fabrication and characterization of ion-induced Ge nanostructures

  • Author

    Miyawaki, A. ; Hayashi, T. ; Ghosh, P. ; Tanemura, M. ; Hayashi, Y. ; Tokunaga, T.

  • Author_Institution
    Dept. of Frontier Mater., Nagoya Inst. of Technol., Nagoya, Japan
  • fYear
    2010
  • Firstpage
    398
  • Lastpage
    399
  • Abstract
    Ge surfaces were irradiated by Ar+ ions at 600 eV with and without a simultaneous supply of Ge, Au or Al at room temperature. The surfaces ion-irradiated without any simultaneous metal supply were characterized by densely distributed conical protrusions. By contrast, various kinds of nanostructures were formed on the Ge surfaces ion-irradiated with a simultaneous metal supply. They featured cones and nanobelts with a flattened top for Ge supply cases, whereas they were characterized by nanorods for Au supply cases and by nanorods, nanobelts and nanowalls for Al supply cases. Very interestingly, the nanorods formed with Au or Al supply possessed a bottleneck structure. Thus, the ion-induced Ge nanostructures were controllable in morphology by species and amount of simultaneously supplied metals.
  • Keywords
    elemental semiconductors; germanium; ion beam effects; nanofabrication; nanostructured materials; Ge; bottleneck structure; densely distributed conical protrusions; ion-induced nanostructures; low-temperature fabrication; morphology; nanobelts; nanorods; nanowalls; simultaneous metal supply; surface irradiation; Acceleration; Crystallization; Fabrication; Gold; Mirrors; Nanostructured materials; Nanostructures; Scanning electron microscopy; Surface morphology; Temperature control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5424518
  • Filename
    5424518