DocumentCode
1656705
Title
Low-temperature fabrication and characterization of ion-induced Ge nanostructures
Author
Miyawaki, A. ; Hayashi, T. ; Ghosh, P. ; Tanemura, M. ; Hayashi, Y. ; Tokunaga, T.
Author_Institution
Dept. of Frontier Mater., Nagoya Inst. of Technol., Nagoya, Japan
fYear
2010
Firstpage
398
Lastpage
399
Abstract
Ge surfaces were irradiated by Ar+ ions at 600 eV with and without a simultaneous supply of Ge, Au or Al at room temperature. The surfaces ion-irradiated without any simultaneous metal supply were characterized by densely distributed conical protrusions. By contrast, various kinds of nanostructures were formed on the Ge surfaces ion-irradiated with a simultaneous metal supply. They featured cones and nanobelts with a flattened top for Ge supply cases, whereas they were characterized by nanorods for Au supply cases and by nanorods, nanobelts and nanowalls for Al supply cases. Very interestingly, the nanorods formed with Au or Al supply possessed a bottleneck structure. Thus, the ion-induced Ge nanostructures were controllable in morphology by species and amount of simultaneously supplied metals.
Keywords
elemental semiconductors; germanium; ion beam effects; nanofabrication; nanostructured materials; Ge; bottleneck structure; densely distributed conical protrusions; ion-induced nanostructures; low-temperature fabrication; morphology; nanobelts; nanorods; nanowalls; simultaneous metal supply; surface irradiation; Acceleration; Crystallization; Fabrication; Gold; Mirrors; Nanostructured materials; Nanostructures; Scanning electron microscopy; Surface morphology; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanoelectronics Conference (INEC), 2010 3rd International
Conference_Location
Hong Kong
Print_ISBN
978-1-4244-3543-2
Electronic_ISBN
978-1-4244-3544-9
Type
conf
DOI
10.1109/INEC.2010.5424518
Filename
5424518
Link To Document