• DocumentCode
    1661264
  • Title

    Modeling yield of carbon-nanotube/silicon-nanowire FET-based nanoarray architecture with h-hot addressing scheme

  • Author

    Zhang, Shanrui ; Choi, Minsu ; Park, Nohpill

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Missouri Univ., Rolla, MO, USA
  • fYear
    2004
  • Firstpage
    356
  • Lastpage
    364
  • Abstract
    With molecular-scale materials, devices and fabrication techniques recently being developed, high-density computing systems in the nanometer domain emerge. An array-based nanoarchitecture has been recently proposed based on nanowires such as carbon nanotubes (CNTs) and silicon nanowires (SiNWs). High-density nanoarray-based systems consisting of nanometer-scale elements are likely to have many imperfections; thus, defect-tolerance is considered one of the most significant challenges. In this paper we propose a probabilistic yield model for the array-based nanoarchitecture. The proposed yield model can be used (1) to accurately estimate the raw and net array densities, and (2) to design and optimize more defect and fault-tolerant systems based on the array-based nanoarchitecture. As a case study, the proposed yield model is applied to the defect-tolerant addressing scheme called h-hot addressing and simulation results are discussed.
  • Keywords
    carbon nanotubes; circuit simulation; computer architecture; elemental semiconductors; integrated circuit modelling; integrated circuit technology; integrated circuit yield; nanoelectronics; nanotube devices; nanowires; silicon; C; CNT; FET-based nanoarray architecture; Si; SiNW; array-based nanoarchitecture; carbon nanotubes; defect-tolerance; defect-tolerant addressing scheme; defect-tolerant systems; fabrication techniques; fault-tolerant systems; h-hot addressing scheme; high-density computing systems; molecular-scale materials; nanometer-scale elements; net array densities; probabilistic yield model; raw array densities; silicon nanowires; simulation; yield modeling; Carbon nanotubes; Chemical elements; Computer architecture; Design optimization; Fabrication; Fault tolerant systems; Nanoscale devices; Nanowires; Silicon; Yield estimation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Defect and Fault Tolerance in VLSI Systems, 2004. DFT 2004. Proceedings. 19th IEEE International Symposium on
  • ISSN
    1550-5774
  • Print_ISBN
    0-7695-2241-6
  • Type

    conf

  • DOI
    10.1109/DFTVS.2004.1347860
  • Filename
    1347860