DocumentCode
1663830
Title
Real-time measurement for fast cycle time
Author
Doering, Robert R.
Author_Institution
Texas Instrum. Inc., Dallas, TX, USA
fYear
1994
Firstpage
297
Abstract
Summary form only given. The most challenging overall goal of the Microelectronics Manufacturing Science and Technology (MMST) Program was the demonstration of 3-day cycle time for manufacturing double-level-metal 0.35-μm CMOS circuits. Achievement of this goal was enabled by development of: (1) a 100% single-wafer processing facility and (2) a substantial implementation of real-time process and factory control. In this paper, we focus on the relationship between cycle time and real-time control
Keywords
CMOS integrated circuits; 0.35 micron; cycle time; double-level-metal CMOS circuits; factory control; microelectronics manufacturing; process control; real-time control; real-time measurement; single-wafer processing; Bibliographies; CMOS technology; Circuits; Instruments; Manufacturing; Observability; Process control; Sensor arrays; Time measurement; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Semiconductor Manufacturing Conference and Workshop. 1994 IEEE/SEMI
Conference_Location
Cambridge, MA
Print_ISBN
0-7803-2053-0
Type
conf
DOI
10.1109/ASMC.1994.588282
Filename
588282
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