• DocumentCode
    1664082
  • Title

    Optimization of scanning path for reducing fabrication time in a novel two-laser beam stereolithography system

  • Author

    Jiang, Cho-Pei ; Chen, Chang-Cheng ; Cheng, Yung-Chang

  • Author_Institution
    Dept. of Power Mech. Eng., Nat. Formosa Univ., Yunlin, Taiwan
  • fYear
    2010
  • Firstpage
    406
  • Lastpage
    411
  • Abstract
    The aim of this study is to develop a novel two-laser beam (TLB) stereolithography system and to optimize scanning path for shortening the fabrication time using adaptive crosshatch technique. In the development of TLB system, the wavelengths of the two semiconductor laser beams are determined to be 405 nm (blue light) and 532 nm (green light), respectively, according to the relative absorbance rate of used visible-light curable resin. The blue light laser is suitable for scanning the object contour due to the fast absorbance and caused a narrow cured depth. The green light laser is used for scanning the internal crosshatch for condensing the fabrication time because its high power results in a wide cured width and deep penetration. The influence of photoabsorber, carbon powder with average diameter of 0.1 micrometer, is discussed and specified an optimal weight percentage of 1.5 for controlling cured thickness. An adaptive crosshatch technique is introduced and applied into the fabrication process. In addition, two fan objects with seven blades are fabricated according to the raster scan and adaptive crosshatch scan, respectively. Consequently, the developed system fabricates object quickly with a high accuracy and adaptive crosshatch significantly reduces fabrication time.
  • Keywords
    curing; laser beams; laser materials processing; photolithography; stereolithography; adaptive crosshatch scan; curable resin; fabrication time reduction; object contour; photoabsorber; raster scan; relative absorbance rate; scanning path; semiconductor laser beams; two-laser beam stereolithography system; wavelength 405 nm; wavelength 532 nm; Accuracy; Adaptation model; Clocks; Polymers; Silicon carbide; Surface waves; Thickness measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Modelling, Identification and Control (ICMIC), The 2010 International Conference on
  • Conference_Location
    Okayama
  • Print_ISBN
    978-1-4244-8381-5
  • Electronic_ISBN
    978-0-9555293-3-7
  • Type

    conf

  • Filename
    5553528