• DocumentCode
    1669834
  • Title

    Anisotropic scattering of elongated GaSb/GaAs quantum dots embedded near two-dimensional electron gas

  • Author

    Li, Guodong ; Jiang, Chao ; Sakaki, Hiroyuki

  • Author_Institution
    Nat. Center for Nanosci. & Technol., Beijing, China
  • fYear
    2010
  • Firstpage
    1114
  • Lastpage
    1115
  • Abstract
    Elongated GaSb/GaAs quantum dots (QDs) with a lateral aspect ratio of 2~3 is synthesized by the molecular beam epitaxy (MBE) with carefully controlling the Sb4 beam flux and As4 background pressure. These self-assembled quantum dots having geometrical anisotropy are embedded in the vicinity of the two-dimensional electron gas (2DEG). Anisotropic hall mobilities of the 2DEG under the helium temperature transport measurements were confirmed. The mobility in the [110] direction is larger than that in the [1-10] direction. It is believed that this mobility difference is due to the anisotropic scattering potential of the GaSb/GaAs QDs owing to their large geometrical anisotropy. Under constant potential model of square barrier, we proved these anisotropic quantum dots show larger scattering cross-section in the [1-10] direction than in the [110] direction for transporting electrons.
  • Keywords
    Hall mobility; III-V semiconductors; electron mobility; gallium arsenide; gallium compounds; molecular beam epitaxial growth; self-assembly; semiconductor quantum dots; two-dimensional electron gas; GaSb-GaAs; [1-10] direction; [110] direction; anisotropic hall mobility; anisotropic scattering; beam flux; electron transport; elongated quantum dots; geometrical anisotropy; molecular beam epitaxy; self-assembled quantum dots; two-dimensional electron gas; Anisotropic magnetoresistance; Electrons; Gallium arsenide; Molecular beam applications; Molecular beam epitaxial growth; Molecular beams; Particle scattering; Pressure control; Quantum dots; Temperature measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoelectronics Conference (INEC), 2010 3rd International
  • Conference_Location
    Hong Kong
  • Print_ISBN
    978-1-4244-3543-2
  • Electronic_ISBN
    978-1-4244-3544-9
  • Type

    conf

  • DOI
    10.1109/INEC.2010.5425008
  • Filename
    5425008