DocumentCode :
1684437
Title :
Control of liquid flow distribution utilizing EHD conduction pumping mechanism
Author :
Feng, Yinshan ; Seyed-Yagoobi, Jamal
Author_Institution :
Mech., Mater., & Aerosp. Eng. Dept., Illinois Inst. of Technol., Chicago, IL, USA
Volume :
4
fYear :
2004
Firstpage :
2345
Abstract :
A maldistribution of liquid flow in parallel evaporators may cause local hot areas, leading to dry-out of branch lines and resulting in a nonoptimum performance. The electrohydrodynamic (EHD) conduction pumping shows its potential as an active control method of the flow distribution. The EHD conduction pumping is associated with the heterocharge layers of finite thickness in the vicinity of the electrodes, which are based on the process of dissociation of the neutral electrolytic species and recombination of the generated ions. This work presents the successful control of liquid flow distribution between two branch lines utilizing an EHD conduction pump at total mass flux levels of 100 and 200 kg/m2s.
Keywords :
dissociation; electrodes; electrohydrodynamics; evaporation; flow control; ion recombination; pipe flow; pumps; EHD conduction pumping mechanism; active control method; electrodes; electrohydrodynamics; electrolytic species; heterocharge layers; ions recombination; liquid flow distribution control; mass flux; parallel evaporators; pipe flow; Control systems; Electrodes; Electrohydrodynamics; Fluid flow; Permittivity; Pumps; Thermal conductivity; Thermal force; Thermal management; Weight control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industry Applications Conference, 2004. 39th IAS Annual Meeting. Conference Record of the 2004 IEEE
ISSN :
0197-2618
Print_ISBN :
0-7803-8486-5
Type :
conf
DOI :
10.1109/IAS.2004.1348802
Filename :
1348802
Link To Document :
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