A systematic methodology for etch chamber matching to meet leading edge requirements

In this paper, we described a systematic methodology for chamber matching required to meet the increasingly requirements for advanced etch technology. The basis of this methodology is the sensitivity-variability framework by which we accurately measure the inherent variability of each hardware subsystem and understand the sensitivity of processes to that that hardware variability. The advantages are that we can understand the expected variability of a given recipe and the solution paths required to make that process more repeatable.