MEMS lithography collaborative simulation environment research

Author

Shen, Lianguan ; Wang, Meiyan ; Hao, Yu ; Zhao, Gaofei ; Shu, Zhao ; Yuan, Sun ; Wang, Xiaodong ; Li, Mujun ; Zheng, Jinjin

Author_Institution

Dept. of Precision Machinery & Precision Instrum., Univ. of Sci. & Technol. of China, Hefei

fYear

2008

Firstpage

913

Lastpage

918

Abstract

A web-based collaborative design platform is presented for design MEMS structure. The design platform consists of four parts: mask design and optimization, lithography simulation, 3D reconstruction and synchronous display. Some special technologies in constructing the platform are described. An entity- based access control mechanism is employed to settle confliction in collaborative design process; MC algorithm is used to reconstruct 3D entities. A method is proposed to make up for the shortfall of MC to cover the holes in forming 3D surface. Application of the research will shorten the production cycle of MEMS and access higher accuracy significantly.

Keywords

Internet; electronic engineering computing; groupware; lithography; micromechanical devices; 3D reconstruction; MEMS lithography collaborative simulation; Web-based collaborative design platform; mask design; synchronous display; Access control; Algorithm design and analysis; Collaboration; Design optimization; Lithography; Micromechanical devices; Process design; Production; Surface reconstruction; Three dimensional displays; 3D reconstruction; Collaborative Design; Confliction avoid; MEMS; Synchronous display;

fLanguage

English

Publisher

ieee

Conference_Titel

Computer Supported Cooperative Work in Design, 2008. CSCWD 2008. 12th International Conference on

Conference_Location

Xi´an

Print_ISBN

978-1-4244-1650-9

Electronic_ISBN

978-1-4244-1651-6

Type

conf

DOI

10.1109/CSCWD.2008.4537101

Filename

4537101