DocumentCode
1703732
Title
Advanced Device Fabrication With Angled Chlorine Ion Beam Assisted Etching
Author
Goodhue, W.D. ; Pang, S.W. ; Hollis, M.A. ; Donnelly, J.P.
Author_Institution
Massachusetts Institute of Technology
fYear
1987
Firstpage
239
Lastpage
246
Keywords
Argon; Etching; FETs; Fabrication; Gallium arsenide; Ion beams; Optical arrays; Resists; Semiconductor laser arrays; Vertical cavity surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
High Speed Semiconductor Devices and Circuits, 1987. Proceedings., IEEE/Cornell Conference on Advanced Concepts in
Conference_Location
Ithaca, NY, USA
Type
conf
DOI
10.1109/CORNEL.1987.721233
Filename
721233
Link To Document