• DocumentCode
    1709686
  • Title

    Gyrotron-powered millimeter-wave beam facility for microwave processing of materials

  • Author

    Fliflet, A.W. ; Bruce, R.W. ; Fischer, R.P. ; Kinkead, A.K. ; Gold, S.H. ; Ganguly, S.

  • Author_Institution
    Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
  • fYear
    1999
  • Firstpage
    151
  • Abstract
    Summary form only given, as follows. The high intensity millimeter-wave beams (10/sup 3/-10/sup 5/ W/cm/sup 2/) that can be generated by powerful gyrotron oscillators have unique capabilities for rapid, selective heating of nonmetallic materials. A new CW gyrotron-based system is being set up at the Naval Research Laboratory (NRL) to investigate such beams. The facility is being operated jointly by NRL and the Center for Remote Sensing (CRS) and will be applied to important areas of material processing including: coating of materials, soldering and brazing, and treatment of ceramics and polymers. The heart of the system is a Gycom, Ltd. industrial 83 GHz gyrotron operating at 27 kV and 1.9 A, and producing 15 kW of power in a Gaussian beam. This paper will describe the new facility, including the gyrotron, work chamber, and control system. Available results of initial beam characterization and material heating experiments will also be presented.
  • Keywords
    brazing; ceramics; gyrotrons; millimetre wave oscillators; polymers; soldering; 1.9 A; 15 kW; 27 kV; 83 GHz; brazing; ceramics; coating; control system; gyrotron oscillators; gyrotron-powered millimeter-wave beam facility; high intensity millimeter-wave beams; initial beam characterization; material heating; microwave materials processing; nonmetallic materials; polymers; soldering; work chamber; Coatings; Electromagnetic heating; Gyrotrons; High power microwave generation; Joining materials; Laboratories; Materials processing; Microwave oscillators; Power generation; Remote sensing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829393
  • Filename
    829393