Title :
A review of the performance of the vacuum spark (VSX) and the spherical pinch (SPX) X-ray/EUV point sources
Author :
Wu, Feng ; Tang, Wei ; Wirpszo, K.W. ; Panarella, E.
Author_Institution :
Adv. Laser & Fusion Technol. Inc., Hull, Que., Canada
Abstract :
Summary form only given. The technology of X-ray/EUV point plasma sources is competing with the multiple beam synchrotrons as radiation sources for submicron lithography. The company ALFT has been doing research and development on two plasma point sources for several years now. They are the vacuum spark (VSX) and spherical pinch (SPX) technologies. Both have a long history of previous research to support the contention that are well qualified to be converted into technological tools for the manufacturing of the next generation of chips. The VSX is essentially a miniature discharge capable of emitting soft X-ray radiation. Because the radiation is emitted in small dose in each spark, it is necessary to repeat the phenomenon at high frequency in order to have a quasi-continuous wave. Over a long time, the soft X-ray power distribution will be nearly uniform, thus meeting the requirement for microlithography. The SPX is mainly a strong source of EUV radiation that operates at a frequency of one hertz or more.
Keywords :
X-ray lithography; X-ray production; pinch effect; spectroscopic light sources; ultraviolet lithography; EUV point sources; X-ray point sources; energy conversion efficiency; heat extraction; miniature discharge; multiple beam synchrotrons; optimisation; plasma point sources; quasi-continuous wave; radiation emission; radiation emitting region; radiation sources; repetition rate; semiconductor chips; soft X-ray power distribution; soft X-ray radiation; spherical pinch; spherical pinch technology; submicron lithography; vacuum spark; vacuum spark technology; Frequency; Lithography; Particle beams; Plasma materials processing; Plasma sources; Plasma x-ray sources; Research and development; Sparks; Synchrotron radiation; Vacuum technology;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829471