DocumentCode
1713239
Title
Influence of the microwave magnetic field on high power microwave window breakdown
Author
Hemmert, D. ; Neuber, A. ; Dickens, J. ; Krompholz, H. ; Hatfield, L.L. ; Kristiansen, M.
Author_Institution
Dept. of Electr. Eng., Texas Tech. Univ., Lubbock, TX, USA
fYear
1999
Firstpage
229
Abstract
Summary form only given. Effects of the microwave magnetic field on window breakdown are investigated at the upstream and downstream side of a dielectric interface. Simple trajectory calculations of secondary electrons in an RF field show significant forward motion of electrons parallel to the microwave direction of propagation. The Lorentz-force due to the microwave magnetic field on high-energy secondary electrons might substantially influence the standard multipactor mechanism. As a result, the breakdown power level for the downstream side of a window would be higher than for the upstream side. This hypothesis was tested utilizing an S-band traveling wave resonant ring, powered by a 3 MW magnetron at 2.85 GHz, leading to a total power greater than 60 MW. Breakdown was studied on an interface geometry consisting of a thin alumina slab in the waveguide, oriented normal to the microwave propagation direction.
Keywords
UHF tubes; electric breakdown; magnetic field effects; microwave propagation; travelling wave tubes; 2.85 GHz; 3 MW; 60 MW; RF field; S-band traveling wave resonant ring; X-ray imaging; breakdown power level; dielectric interface; distributed X-ray source; downstream side; field enhancement tips; forward motion; high power microwave window breakdown; high speed imaging; high-energy secondary electrons; interface geometry; local field probes; magnetron; microwave Lorentz force; microwave direction of propagation; microwave magnetic field; power probes; secondary electrons; standard multipactor mechanism; thin alumina slab; upstream side; Dielectric breakdown; Electric breakdown; Electrons; Geometry; Magnetic resonance; Microwave magnetics; Microwave propagation; Radio frequency; Slabs; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829539
Filename
829539
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