DocumentCode :
1717587
Title :
A novel radio-frequency plasma probe for monitoring systems in dielectric deposition processes
Author :
Schulz, C. ; Styrnoll, T. ; Lapke, M. ; Oberrath, J. ; Storch, R. ; Awakowicz, P. ; Brinkmann, R.P. ; Musch, T. ; Mussenbrock, T. ; Rolfes, I.
Author_Institution :
Inst. of Microwave Syst., Ruhr-Univ. Bochum, Bochum, Germany
fYear :
2012
Firstpage :
728
Lastpage :
731
Abstract :
This paper presents a novel industry compatible plasma probe for monitoring systems in dielectric deposition processes. The probe is based on the so called active plasma resonance spectroscopy and allows an extensive evaluation of different important plasma parameters, needed for the supervision and control of the plasma deposition process. Due to its assembly, the probe is insensitive against additional dielectric coating. Hence, the measurement performance is not affected. 3D-electromagnetic field simulations of the probe in a pseudo plasma deposition process, as well as the measurement with a prototype in a real deposition process show a good agreement with the expected behaviour and confirm the applicability of the probe as a monitoring tool for dielectric deposition processes.
Keywords :
plasma materials processing; plasma probes; process monitoring; vapour deposition; 3D electromagnetic field simulations; active plasma resonance spectroscopy; dielectric coating; dielectric deposition process monitoring; plasma deposition process control; plasma deposition process supervision; plasma parameters; pseudoplasma deposition process; radiofrequency plasma probe; Coatings; Dielectrics; Electron tubes; Materials requirements planning; Plasma measurements; Plasmas; Probes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electromagnetics in Advanced Applications (ICEAA), 2012 International Conference on
Conference_Location :
Cape Town
Print_ISBN :
978-1-4673-0333-0
Type :
conf
DOI :
10.1109/ICEAA.2012.6328725
Filename :
6328725
Link To Document :
بازگشت