• DocumentCode
    1722979
  • Title

    Gain reduction by gate-leakage currents in regulated cascodes

  • Author

    Schlögl, F. ; Schneider-Hornstein, K. ; Zimmermann, H.

  • Author_Institution
    Inst. of Electr. Meas. & Circuit Design, Vienna Univ. of Technol., Vienna
  • fYear
    2008
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    The gain reduction of nanometer-size MOS transistors due to the high output conductance of the devices is already discussed in the literature. This paper discusses an additional issue which leads to further gain reduction - the gate-leakage current. On the basis of the example of a regulated cascode in 130 nm CMOS and in 65 nm CMOS it is estimated that this shrinking step decreases the gain due to gate-leakage current by about 30 to 40 dB.
  • Keywords
    CMOS integrated circuits; MOSFET; leakage currents; CMOS; cascode; gain reduction; gate-leakage current; nanometer-size MOS transistor; size 130 nm; size 65 nm; Circuit synthesis; Energy consumption; Gate leakage; Leakage current; MOSFETs; Parasitic capacitance; Signal design; Transconductance; Transistors; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Design and Diagnostics of Electronic Circuits and Systems, 2008. DDECS 2008. 11th IEEE Workshop on
  • Conference_Location
    Bratislava
  • Print_ISBN
    978-1-4244-2276-0
  • Electronic_ISBN
    978-1-4244-2277-7
  • Type

    conf

  • DOI
    10.1109/DDECS.2008.4538755
  • Filename
    4538755