• DocumentCode
    1725864
  • Title

    ISPSD ´07 Charitat Award; Split-Gate Resurf Stepped Oxide (RSO) MOSFETS for 25V Applications with Record Low Gate-to-Drain Charge

  • Author

    Goarin, P. ; Koops, G.E.J. ; van Dalen, R. ; LeCam, C. ; Saby, J.

  • Author_Institution
    NXP Semiconductors Kapeldreef 75 B-3001 Leuven Belgium
  • fYear
    2008
  • Abstract
    This paper presents a split-gate version of the Resurf Stepped Oxide (RSO) MOSFET. Splitting the gate enables a drastic reduction of the gate-to-drain capacitance intrinsic to the RSO device concept while keeping all the benefits of the RESURF effect. We achieved a record on-resistance of 3.8 m??mm2 and gate-to-drain charge of 0.9 nCmm2 at a breakdown voltage of 35V for a pitch of 1.3 mm (0.8 mm trench width). The switching losses of our split-gate RSO MOSFET are 4 times better than the best published data in the same voltage range.
  • Keywords
    MOSFET;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    978-1-4244-1532-8
  • Type

    conf

  • DOI
    10.1109/ISPSD.2008.4538879
  • Filename
    4538879