• DocumentCode
    1726564
  • Title

    SJ-FINFET: A New Low Voltage Lateral Superjunction MOSFET

  • Author

    Onishi, Y. ; Wang, H. ; Xu, H.P.E. ; Ng, W.T. ; Wu, R. ; Sin, J.K.O.

  • Author_Institution
    Electron Device Lab., Fuji Electr. Device Tech. Co. Ltd., Matsumoto
  • fYear
    2008
  • Firstpage
    111
  • Lastpage
    114
  • Abstract
    This paper proposes a new SOI lateral superjunction (SJ) power transistor structure, SJ-FINFET, to address the requirement for low voltage lateral MOSFETs with low specific on-resistance (Ron,sp). The SJ-FINFET consists of a 3D trench gate and a SJ drift region (the fin) to reduce both the channel resistance and the drift region resistance. The SJ-FINFET with n/p-drift region pillar thickness (SOI layer thickness, Tepi) of 4 mum was simulated and found to have a Ron,sp of 0.18 mOmegaldrcm2. This is 21% lower than the well-known silicon limit at a breakdown voltage (BVdss) of 68 V.
  • Keywords
    MOSFET; electric resistance; power transistors; silicon-on-insulator; SOI lateral superjunction power transistor; channel resistance; drift region resistance; low voltage lateral MOSFET; trench gate; Electron devices; Laboratories; Low voltage; MOSFET circuits; Power MOSFET; Power engineering and energy; Power engineering computing; Power semiconductor devices; Silicon compounds; Surface resistance;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and IC's, 2008. ISPSD '08. 20th International Symposium on
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    978-1-4244-1532-8
  • Electronic_ISBN
    978-1-4244-1533-5
  • Type

    conf

  • DOI
    10.1109/ISPSD.2008.4538910
  • Filename
    4538910