DocumentCode :
1730065
Title :
High-voltage microsecond pulse generator for plasma immersion ion implantation
Author :
Vizir, V.A. ; Zorin, V.B. ; Ivanov, S.V. ; Kovalchuk, B.M. ; Maksimenko, A.D. ; Manilov, V.I. ; Smorudov, G.V. ; Shubkin, N.G. ; Chervyakov, V.V.
fYear :
2001
Firstpage :
179
Abstract :
Summary form only given, as follows. The generator is intended to supply plasma immerse ion implanters. It has the following parameters: voltage pulse amplitude - (20-60) kV, current pulse amplitude - (100-40) A, pulse length (5-20) /spl mu/s, leading edge length - 1 /spl mu/s, decay length 2 /spl mu/s, pulse frequency - up to 1000 Hz, average power - up to 10 kW. The generator is made by the scheme of a modulator with a partial capacity discharge. A high-power modulator tube GMI-29?1 (40 kV, 200 A) is used as a switch. A driver is made from a JGBT transistor. A pulse from the modulator is applied by the cable to the step-up pulsed transformer placed near the implanter. The transformer has a winding switch allowing control of the output voltage from 20 to 60 kV at a distance by 6 steps. Smooth control is realized by the power supply. The modulator has the current protection of the power supply and rapid (0.5 us) current protection of the modulator tube. The modulator can be controlled both from the local control board and at a distance - from the computer. The modulator has a load equivalent on the basis of a water resistor.
Keywords :
ion implantation; modulators; plasma devices; plasma materials processing; pulse generators; pulse transformers; pulsed power supplies; pulsed power switches; 0.5 mus; 1 mus; 10 kW; 100 to 40 A; 1000 Hz; 2 mus; 20 to 60 kV; 200 A; 40 kV; 5 to 20 mus; GMI-29?1; JGBT transistor; average power; cable; computer; current protection; current pulse amplitude; decay length; distance; driver; high-power modulator tube; high-voltage microsecond pulse generator; implanter; leading edge length; load equivalent; local control board; modulator; modulator tube; output voltage; partial capacity discharge; plasma immersion ion implantation; power supply; pulse frequency; pulse length; rapid current protection; smooth control; step-up pulsed transformer; switch; voltage pulse amplitude; water resistor; winding switch; Frequency; Plasmas; Power supplies; Protection; Pulse generation; Pulse modulation; Pulse transformers; Pulsed power supplies; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
Type :
conf
DOI :
10.1109/PPPS.2001.960755
Filename :
960755
Link To Document :
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