Title :
"Point" X-ray source engendered by hot spots in a high-current discharge
Abstract :
Summary form only given, as follows. The hot spots occurred in high-Z plasma of high-current vacuum discharges observed to be the bright sources of EUV and X-rays. The thorough study of discharge dynamics and radiation performance of a vacuum spark was carried out previously. The experimental model of industrial EUV/X-ray source was designed and tested and its application for X-ray lithography and X-ray microscopy was examined. The experiments showed that the hot spot is a local high-density, high-temperature plasmoid caused by the "neck" development on the discharge plasma column and subsequent compression of the neck pinch, apparently, because of the radiation losses from the compressing plasma. Eventually, one or several high-density "micropinches" are generated in the neck emitting a burst of soft X-ray radiation produced by the highly ionized atoms mostly in the form of line radiation. The micropinch (hot spot) size displayed by radiation near 1 keV is approximately 40/spl times/150 micrometers; usually it decays into several spots recorded in radiation above 4 keV. The X-ray output from a separate micropinch was evaluated /spl sim/10/sup -15/ W/sr cm/sup -3/ for a spectral band 0.5-1.5 keV. The details of neck evolution are discussed and the limiting conditions for micropinch occurrence are outlined. The experimental data are compared with the computer simulation of high-Z plasma pinch compression allowing for radiative losses.
Keywords :
X-ray production; Z pinch; discharges (electric); light sources; losses; pinch effect; plasma density; plasma temperature; 0.5 to 1.5 keV; 1 keV; 150 micron; 4 keV; 40 micron; EUV source; X-ray lithography; X-ray microscopy; X-ray output; X-ray source; compressing plasma; compression; computer simulation; discharge dynamics; discharge plasma column; high-Z plasma; high-Z plasma pinch compression; high-current discharge; high-current vacuum discharges; high-density micropinches; highly ionized atoms; hot spot; hot spots; industrial EUV/X-ray source; limiting conditions; line radiation; local high-density high-temperature plasmoid; micropinch; micropinch occurrence; micropinch size; neck development; neck evolution; neck pinch; point X-ray source; radiation losses; radiation performance; radiative losses; soft X-ray radiation; spectral band; vacuum spark; Fault location; Ionizing radiation; Microscopy; Neck; Plasma applications; Plasma sources; Plasma x-ray sources; Sparks; Testing; X-ray lithography;
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
DOI :
10.1109/PPPS.2001.960772