Title :
Stress Profile Characterization And Test Structures Analysis Of Single And Double Ion Implanted LPCVD Polycrystalline Silicon
Author :
Benítez, M.A. ; Esteve, J. ; Benrakkad, S. ; Morante, J.R. ; Samitier, J. ; Schweitz, J.A.
Author_Institution :
Centre Nacional de Microclectronica CSIC
Keywords :
Annealing; Compressive stress; Doping; Fabrication; Micromachining; Residual stresses; Silicon; Temperature; Tensile stress; Testing;
Conference_Titel :
Solid-State Sensors and Actuators, 1995 and Eurosensors IX.. Transducers '95. The 8th International Conference on
Print_ISBN :
91-630-3473-5
DOI :
10.1109/SENSOR.1995.721751
