Title :
Multi-kilovolt solid-state picosecond switch studies
Author :
Frost, C.A. ; Focia, R.J. ; Stockebrand, T.C. ; Walker, Andrew J.
Abstract :
Summary form only given. Ultra-low-jitter repetitive solid state picosecond switching is being developed for application to electromagnetic impulse sources. Ultra-low-jitter and fast risetime are required to synchronize multiple modules of radiating array sources. Laser controlled photoconducting switches provide low jitter but have limited lifetime and are too expensive for many commercial applications. We are studying an alternative method using multiple delayed breakdown semiconductor closing switches to drive arrays of impulse radiating antennas. We will present theory, simulations, and experimental results for silicon and silicon-carbide devices. The devices are rapidly pulse charged to enable low jitter picosecond switching. Single devices have demonstrated reliable operation with risetime of approximately 100 ps at hold-off voltage exceeding 4 kV. We have also developed arrays of series and parallel connected devices which enable powerful picosecond pulse generation for radiating impulse sources and other applications.
Keywords :
antenna arrays; digital simulation; jitter; photoconducting switches; 100 ps; 4 kV; electromagnetic impulse sources; hold-off voltage; impulse radiating antenna arrays; laser controlled photoconducting switches; low jitter picosecond switching; multi-kilovolt solid-state picosecond switch; multiple delayed breakdown semiconductor closing switches; multiple modules; parallel connected device arrays; picosecond pulse generation; radiating array sources; radiating impulse sources; risetime; series connected device arrays; silicon devices; silicon-carbide devices; synchronisation; ultra-low-jitter repetitive solid state picosecond switching; Delay; Electric breakdown; Electromagnetic radiation; Jitter; Laser theory; Optical control; Photoconductivity; Semiconductor laser arrays; Solid state circuits; Switches;
Conference_Titel :
Pulsed Power Plasma Science, 2001. IEEE Conference Record - Abstracts
Conference_Location :
Las Vegas, NV, USA
Print_ISBN :
0-7803-7141-0
DOI :
10.1109/PPPS.2001.960861