• DocumentCode
    1733944
  • Title

    Impact of floating the well contact on the low temperature kink in n-channel CMOS transistors

  • Author

    Kasley, Kathy L. ; Oleszek, Gerald M. ; Anderson, Richard L.

  • Author_Institution
    Dept. of Electr. Eng., Colorado Univ., Colorado Springs, CO, USA
  • fYear
    1989
  • Firstpage
    128
  • Lastpage
    132
  • Abstract
    The effect of electrically floating the well on the low-temperature kink in n-channel CMOS transistors was investigated experimentally. Id-Vd (drain current-drain voltage) curves at 13 K with the well grounded and with the well floating were obtained. The low-temperature kink in the I d-Vd characteristics of n-channel CMOS transistors was found to be affected by the contact of the well. When the well contact is floated, only the first Id- Vd trace displays a kink and hysteresis. Subsequent curves show little, if any, kink, but are consistent with the after-kink drain currents measured with the well contact grounded
  • Keywords
    cryogenics; insulated gate field effect transistors; 13 K; I-V characteristics; after-kink drain currents; drain current drain voltage curves; hysteresis; low temperature kink; n-channel CMOS transistors; well contact floating; Displays; Land surface temperature; Length measurement; MOSFETs; Potential well; Semiconductor device packaging; Springs; Temperature control; Temperature dependence; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Low Temperature Semiconductor Electronics, 1989., Proceedings of the Workshop on
  • Conference_Location
    Burlington, VT
  • Type

    conf

  • DOI
    10.1109/LTSE.1989.50196
  • Filename
    50196