DocumentCode
1734544
Title
Efficiently Performing Yield Enhancements by Identifying Dominant Physical Root Cause from Test Fail Data
Author
Sharma, Manish ; Benware, Brady ; Ling, Lei ; Abercrombie, David ; Lee, Lincoln ; Keim, Martin ; Tang, Huaxing ; Cheng, Wu-Tung ; Tai, Ting-Pu ; Chang, Yi-Jung ; Lin, Reinhart ; Man, Albert
Author_Institution
Mentor Graphics Corp., Wilsonville, OR
fYear
2008
Firstpage
1
Lastpage
9
Abstract
Yield enhancements in the manufacturing process today require an expensive, long and tedious physical failure analysis process to identify the root cause. In this paper we present Axiom, a new technique geared towards efficiently identifying a single dominant defect mechanism (for example in an excursion wafer) by analyzing fail data collected from the production test environment. Axiom utilizes statistical hypothesis testing in a novel way to analyze logic diagnosis data along with information on physical features in the design layout and reliably identify the dominant cause for yield loss. This new methodology was validated by applying it to a single excursion wafer produced on a 90 nm process, in which the dominant failing physical feature was correctly identified.
Keywords
integrated circuit layout; integrated circuit testing; integrated circuit yield; design layout; manufacturing process; single excursion wafer; statistical hypothesis testing; test fail data; yield enhancements; Data analysis; Fabrication; Failure analysis; Graphics; History; Logic design; Logic testing; Manufacturing processes; Performance evaluation; Production;
fLanguage
English
Publisher
ieee
Conference_Titel
Test Conference, 2008. ITC 2008. IEEE International
Conference_Location
Santa Clara, CA
ISSN
1089-3539
Print_ISBN
978-1-4244-2402-3
Electronic_ISBN
1089-3539
Type
conf
DOI
10.1109/TEST.2008.4700589
Filename
4700589
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