• DocumentCode
    1734544
  • Title

    Efficiently Performing Yield Enhancements by Identifying Dominant Physical Root Cause from Test Fail Data

  • Author

    Sharma, Manish ; Benware, Brady ; Ling, Lei ; Abercrombie, David ; Lee, Lincoln ; Keim, Martin ; Tang, Huaxing ; Cheng, Wu-Tung ; Tai, Ting-Pu ; Chang, Yi-Jung ; Lin, Reinhart ; Man, Albert

  • Author_Institution
    Mentor Graphics Corp., Wilsonville, OR
  • fYear
    2008
  • Firstpage
    1
  • Lastpage
    9
  • Abstract
    Yield enhancements in the manufacturing process today require an expensive, long and tedious physical failure analysis process to identify the root cause. In this paper we present Axiom, a new technique geared towards efficiently identifying a single dominant defect mechanism (for example in an excursion wafer) by analyzing fail data collected from the production test environment. Axiom utilizes statistical hypothesis testing in a novel way to analyze logic diagnosis data along with information on physical features in the design layout and reliably identify the dominant cause for yield loss. This new methodology was validated by applying it to a single excursion wafer produced on a 90 nm process, in which the dominant failing physical feature was correctly identified.
  • Keywords
    integrated circuit layout; integrated circuit testing; integrated circuit yield; design layout; manufacturing process; single excursion wafer; statistical hypothesis testing; test fail data; yield enhancements; Data analysis; Fabrication; Failure analysis; Graphics; History; Logic design; Logic testing; Manufacturing processes; Performance evaluation; Production;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Test Conference, 2008. ITC 2008. IEEE International
  • Conference_Location
    Santa Clara, CA
  • ISSN
    1089-3539
  • Print_ISBN
    978-1-4244-2402-3
  • Electronic_ISBN
    1089-3539
  • Type

    conf

  • DOI
    10.1109/TEST.2008.4700589
  • Filename
    4700589