Title :
ULSI technology development trend
Author :
Okuto, Yuji ; Kunio, Takemitsu
Author_Institution :
Natural Sci. Center, Nagoya City Univ., Japan
Abstract :
Owing to the progress of various technology, integration scale and performance of ULSI is making continuous progress. However, depending on progress stage, main area of development has been varied. Lately, fine-scale CMOS, interconnect technology and nonvolatile memory are the main area of interest. In this paper, present technology development trend on these areas will be discussed
Keywords :
ULSI; integrated circuit technology; technological forecasting; ULSI technology; development trends; fine-scale CMOS; interconnect technology; nonvolatile memory; Annealing; Binary search trees; CMOS technology; FETs; Insulation; Laser beams; Lattices; Silicon; Ultra large scale integration; X-ray lasers;
Conference_Titel :
Semiconductor Conference, 2000. CAS 2000 Proceedings. International
Conference_Location :
Sinaia
Print_ISBN :
0-7803-5885-6
DOI :
10.1109/SMICND.2000.890183
